Fundamental gas-phase and surface chemistry of vapor-phase deposition II and process control, diagnostics, and modeling in semiconductor manufacturing IV : proceedings of the international symposium

著者

• Swihart, M. T.
• Allendorf, Mark Donald
• Meyyappan, M.
• Electrochemical Society. High Temperature Materials Division
• Electrochemical Society. Dielectric Science and Technology Division

書誌事項

Fundamental gas-phase and surface chemistry of vapor-phase deposition II and process control, diagnostics, and modeling in semiconductor manufacturing IV : proceedings of the international symposium

editors, M.T. Swihart, M.D. Allendorf, M. Meyyappan

（Proceedings / [Electrochemical Society], v. 2001-13）

Electrochemical Society, c2001

注記

Includes bibliographical references and indexes

詳細情報

• NII書誌ID(NCID): BA59006533
• ISBN:
  • 1566773199
• LCCN: 2001092515
• 出版国コード: us
• タイトル言語コード: eng
• 本文言語コード: eng
• 出版地: Pennington, N.J.
• ページ数/冊数: ix, 508 p.
• 大きさ: 24 cm
• 親書誌ID:
  • BA01323290