2002 7th International Symposium on Plasma- and Process-Induced Damage

著者

• International Symposium on Plasma Process-Induced Damage
• Hook, Terence
• Eriguchi, Koji
• Gabriel, Calvin T.
• IEEE Electron Devices Society

書誌事項

2002 7th International Symposium on Plasma- and Process-Induced Damage

Terence Hook, Koji Eriguchi, and Calvin T. Gabriel, editors

AVS, c2002

タイトル別名

Two thousand and two seventh International Symposium on Plasma- and Process-Induced Damage

注記

"P2ID"-- on cover

"IEEE Catalog Number (softbound) 02TH8582" -- T.p. verso

Includes bibliographical references and index

詳細情報

• NII書誌ID(NCID): BA62234616
• ISBN:
  • 0965157776
• 出版国コード: us
• タイトル言語コード: eng
• 本文言語コード: eng
• 出版地: Santa Clara, Calif.
• ページ数/冊数: i, 177 p.
• 大きさ: 28 cm
• 件名:
  • LCSH : Semiconductor wafers -- Defects -- Congresses
  • LCSH : Semiconductors -- Effect of radiation on -- Congresses
  • LCSH : Plasma etching -- Congresses