2002 7th International Symposium on Plasma- and Process-Induced Damage

Author(s)

• International Symposium on Plasma Process-Induced Damage
• Hook, Terence
• Eriguchi, Koji
• Gabriel, Calvin T.
• IEEE Electron Devices Society

Bibliographic Information

2002 7th International Symposium on Plasma- and Process-Induced Damage

Terence Hook, Koji Eriguchi, and Calvin T. Gabriel, editors

AVS, c2002

Other Title

Two thousand and two seventh International Symposium on Plasma- and Process-Induced Damage

Note

"P2ID"-- on cover

"IEEE Catalog Number (softbound) 02TH8582" -- T.p. verso

Includes bibliographical references and index

Details

• NCID: BA62234616
• ISBN:
  • 0965157776
• Country Code: us
• Title Language Code: eng
• Text Language Code: eng
• Place of Publication: Santa Clara, Calif.
• Pages/Volumes: i, 177 p.
• Size: 28 cm
• Subject Headings:
  • LCSH : Semiconductor wafers -- Defects -- Congresses
  • LCSH : Semiconductors -- Effect of radiation on -- Congresses
  • LCSH : Plasma etching -- Congresses