Pulsed and pulsed bias sputtering : principles and applications

Author(s)

• Barnat, Edward V.
• Lu, T.-M. (Toh-Ming)

Bibliographic Information

Pulsed and pulsed bias sputtering : principles and applications

by Edward V. Barnat, Toh-Ming Lu

Kluwer Academic, c2003

Note

Includes bibliographical references ( p. [149]-155) and index

Details

• NCID: BA65099889
• ISBN:
  • 140207543X
• LCCN: 2003054987
• Country Code: us
• Title Language Code: eng
• Text Language Code: eng
• Place of Publication: Boston
• Pages/Volumes: x, 155 p.
• Size: 25 cm
• Classification:
  • LCC : TS695
  • DC21 : 621.3815/2
• Subject Headings:
  • LCSH : Cathode sputtering (Plating process)
  • LCSH : Thin films