2003 8th International Symposium on Plasma- and Process-Induced Damage, April 24-25, 2003, Corbeil-Essonnes, France

Author(s)

Bibliographic Information

2003 8th International Symposium on Plasma- and Process-Induced Damage, April 24-25, 2003, Corbeil-Essonnes, France

Koji Eriguchi, S. Krishnan, and Terence Hook, editors

IEEE Operations Center, c2003

Other Title

P2ID

03TH8669

Available at  / 1 libraries

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Note

"P2ID"-- on cover

"IEEE Catalog Number 03TH8669" -- T.p. verso

Includes bibliographical references

Description and Table of Contents

Description

This text covers topics including; damage mechanism and modelling; antenna effect and process monitoring; high-K gate dielectric; and integration.

by "Nielsen BookData"

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