2003 8th International Symposium on Plasma- and Process-Induced Damage, April 24-25, 2003, Corbeil-Essonnes, France

著者

• International Symposium on Plasma Process-Induced Damage
• Hook, Terence
• Eriguchi, Koji
• Krishnan, S.

書誌事項

2003 8th International Symposium on Plasma- and Process-Induced Damage, April 24-25, 2003, Corbeil-Essonnes, France

Koji Eriguchi, S. Krishnan, and Terence Hook, editors

IEEE Operations Center, c2003

タイトル別名

P2ID

03TH8669

注記

"P2ID"-- on cover

"IEEE Catalog Number 03TH8669" -- T.p. verso

Includes bibliographical references

内容説明・目次

内容説明

This text covers topics including; damage mechanism and modelling; antenna effect and process monitoring; high-K gate dielectric; and integration.

「Nielsen BookData」 より

詳細情報

• NII書誌ID(NCID): BA66598920
• ISBN:
  • 0780377478
• LCCN: 2002116918
• 出版国コード: us
• タイトル言語コード: eng
• 本文言語コード: eng
• 出版地: Piscataway, N.J.
• ページ数/冊数: 189 p.
• 大きさ: 28 cm
• 件名:
  • LCSH : Semiconductor wafers -- Defects -- Congresses
  • LCSH : Semiconductors -- Effect of radiation on -- Congresses
  • LCSH : Plasma etching -- Congresses