Principles of plasma discharges and materials processing

Author(s)

• Lieberman, M. A. (Michael A.)
• Lichtenberg, Allan J.

Bibliographic Information

Principles of plasma discharges and materials processing

Michael A. Lieberman, Allan J. Lichtenberg

Wiley-Interscience, c2005

2nd ed

Note

Includes bibliographical references (p. 735-748) and index

Details

• NCID: BA72469354
• ISBN:
  • 9780471720010
• LCCN: 2004058503
• Country Code: us
• Title Language Code: eng
• Text Language Code: eng
• Place of Publication: Hoboken, N.J.
• Pages/Volumes: xxxv, 757 p.
• Size: 25 cm
• Classification:
  • LCC : QC718.5.D9
  • DC22 : 530.4/4
• Subject Headings:
  • LCSH : Plasma dynamics
  • LCSH : Thin films -- Surfaces
  • LCSH : Plasma etching
  • LCSH : Plasma chemistry -- Industrial applications