Formation of silicon nitride from the 19th to the 21st century

書誌事項

Formation of silicon nitride from the 19th to the 21st century

Raymond C. Sangster

(Materials science foundations, 22-24)

Trans Tech Publications, c2005

タイトル別名

Formation of silicon nitride from the 19th to the 21st century : A comprehensive summary and guide to the world literature

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内容説明・目次

内容説明

The elements: Si, N, O, C and H, have strong chemical affinities for one another. Under the correct conditions, Si-N bonding will occur in almost any Si-N-(O/C/H), and many related, reaction systems; although Si-O and Si-C are formidable competitors to Si-N. The most favored Si-N compound is stoichiometric Si3N4. It comes in three common varieties. How they interrelate, how one finds them and (above all ) how one makes them - and how sometimes they just happen to form - are the subjects of this book, with due attention being paid to closely related matters.

目次

Dedication Preface CONTENTS Acronyms and Abbreviations Part A. In the Beginning. Chapter A-1. From the Cosmic to the Mundane Chapter A-2. Book Purpose and Design, Writing Conventions Chapter A-3. Historical Comments re Silicon Nitride Studies Chapter A-4. Natural Occurrence of Si3N4 Chapter A-5. Major Reviews on Formation of Silicon Nitride Part B. Technical Context of Silicon Nitride Formation Chapter B-1. The Si-N System Chapter B-2. Si3N4 Phases and Crystallography Chapter B-3. Phase Chemistry of a-Si3N4 - "-Si3N4 - $-Si3N4 Chapter B-4. High Pressure Phase Chemistry of Si3N4 Chapter B-5. Silicon Nitride Solid Solutions Chapter B-6. Phase Diagram Sources for Si3N4 & SiAlON Ceramic Systems Chapter B-7. Thermodynamics of Si3N4 Chapter B-8. Self-Diffusion in Si3N4 Chapter B-9. Compositional and Phase Analysis of Si3N4 Chapter B-10. Si3N4 Toxicology and Safety Chapter B-11. Engineering Aspects of Silicon Nitride Production Chapter B-12. General Comments on Formation Chemistry of Silicon Nitride Pat C. Si3N4 Products, Uses and Markets Chapter C-1. Survey of Applications and Markets for Si3N4 Materials Chapter C-2. Sintered Silicon Nitride Ceramics Chapter C-3. Overview of Production of Silicon Nitride Powders Chapter C-4. Overview of Si3N4 Whiskers, Fibers, and Filaments Chapter C-5. Overview: Si3N4 Films, Coatings, Membranes, Massive CVD Chapter C-6. Si3N4 Products by Transformation of Si3N4 Source Materials Illustrative Applications I: SRBSN in Automotive Technology. Part D. Si3N4 by Reaction of Si(cr) Surfaces and N-Species Chapter D-1. Comments re Si(s,R,g)/N-Species Preparative Reactions Chapter D-2. Si3N4 from Si(cr/Surface) /N2(g) Chapter D-3. Si3N4 from Si(cr)/Activated Nitrogen Chapter D-4. Si(cr)/N-Ions I. Basic Phenomena of Si3N4 Formation Chapter D-5. Si(cr)/N-Ions II. Ion Plating of Si3N4 Surface Films Chapter D-6. Si(cr)/N-Ions III. Ion Implantation of Buried Si3N4 Layers Part E. Si3N4 Powder Formation from Si(Powder)/N2(g) Chapter E-1. Basic Phenomena in Si3N4 Formation via Si(Powder)/N2(g) Chapter E-2. Si3N4 Powder from Si(powder)/N2/(Impurities & Additives) Chapter E-3. Preparation of Si3N4 Powder via Si(powder)/N2 Illustrative Applications II: SRBSN in Modern Diesel Engines. Part F. Fabrication of Reaction Bonded Silicon Nitride Chapter F-1. RBSN Introduction and Summation Chapter F-2. Reaction Bonded Silicon Nitride Basics Chapter F-3. RBSN Si Powder Effects and Processing Chapter F-4. RBSN Green Shape Effects, Forming, Presintering, Machining Chapter F-5. RBSN Nitridation Chapter F-6. RBSN Product-Process Observations Chapter F-7. RBSN Coating and Impregnation Chapter F-8. Variant Versions of Reaction Bonded Si3N4 Chapter F-9. Doped/Filled/Reinforced RBSN Ceramics Chapter F-10. SRBSN: Post-Sintering of RBSN Part G. Si3N4 from Si/N2 Under Vigorous Conditions Chapter G-1. Si3N4 Formation via Si(R)/N2 Reactions Chapter G-2. Si(powder)/N2(g) Combustion Synthesis of Si3N4 Chapter G-3. SHS Production of Si3N4 Powders, Whiskers and Fibers Chapter G-4. Si3N4 by Si/N2 Reactive Sputtering Chapter G-5. Si3N4 via Si/N2 Reaction in Thermal Plasmas Chapter G-6. Si3N4 Formation via Si(g)/N2, N, N-Plasma, N-Ion Reactions Chapter G-7. Si3N4 Formation via Si+/(N-Plasma, N-Ion) Reactions Chapter G-8. Mechano(-electro)chemical Nitridation of Si Powder Part H. Si3N4 Formation by Reaction of Si with N-Compounds Chapter H-1. Introduction to Si/N-Compound Reactions Chapter H-2. Si3N4 Formation by Thermal Reactions of Si(s)/NH3(g) Chapter H-3. Si3N4 via Stimulated Reactions of Si(s)/NH3(g) Chapter H-4. Si3N4 Formation in other Si/NH3 Reaction Systems Chapter H-5. Si(powder)/NH3(g) Powder Production in Thermal Plasmas Chapter H-6. Si3N4 from Si(s) Plus N-N Bonded and other N-Compounds Part I. Si3N4 by Nitridation of Si-O Based Materials Chapter I-1. Si3N4 Formation via Sio(g,s)/(N2,NH3)/(H2,C,CH4) Chapter I-2. Si3N4 via C-Free Nitridation of SiOxHy, SiO2, Si2N2O Chapter I-3. SiO2/C/N2: Si3N4 by Carbothermal Nitridation of SiO2 Chapter I-4. Si3N4 via other SiO2 Carbothermal Nitridation Systems Chapter I-5. SiO2 Carbothermal Nitridation Impurity/Additive Effects Chapter I-6. Si3N4 via Carbonitridation of Si-O Containing Materials Part J. Si3N4 Formation Si-N Based Materials Chapter J-1. Introduction to Si3N4 from Si-N Based Materials Chapter J-2. Si3N4 Formation by Reactions of Si-N Materials Chapter J-3. Si3N4 from Pyrolysis/Nitridation of Si-N-H Materials, General Chapter J-4. Si3N4 Preparation by Pyrolysis of Si(NH)2 Chapter J-5. Si3N4 via Decomposition of Other Si-N-X Compounds Part K. Comparative Overview and Summary of Si3N4 CVD Chapter K-1. Chemical Vapor Deposition of Si3N4: Fundamentals Chapter K-2. Methods for CVD of Si3N4 Thin Films Part L. Si3N4 by CVD Nitridation of Si-H Compounds Chapter L-1. Preamble: Si3N4 CVD from Silanes Chapter L-2. Si3N4 Chemical Vapor Deposition from SiH4/N2 Chapter L-3. Si3N4 from SiH4/NH3 Thermal Reactions Chapter L-4. Si3N4 Formation via Stimulated CVD from SiH4/NH3 Chapter L-5. SiH4/NH3(g) Formation of Si3N4 Powder Chapter L-6. Si3N4 Formation from SiH4/N2H4(/NH3,N2,H2) Chapter L-7. Si3N4 via Other SiHx CVD Nitridation Systems Part M. Si3N4 by CVD Nitridation of Si Halides and Halosilanes Chapter M-1. Preamble Re Si3N4 CVD from Si Halides and Halosilanes Chapter M-2. Si3N4 via CVD Nitridation of Silicon Fluorides Chapter M-3. Si3N4 Formation via SiCl4/(N2,NH3)(/H2,Ar,He) Reactions Chapter M-4. Si3N4 from SiCl4/NH3 Reactions in Thermal Plasmas Chapter M-5. Si3N4 Formation in Other SiClx Nitridation Systems Chapter M-6. Si3N4 by Nitridation CVD from SiHCl3 Chapter M-7. Si3N4 Formation via SiH2Cl2 Nitridation Chapter M-8. Si3N4 by CVD Nitridation of SiH3Cl, SiBr4, SiHBr3, SiI4 Part N. Si3N4 Formation in Si-C-N Systems Chapter N-1. Si3N4 from Si-C-N-H(-Cl) CVD Reaction Systems Chapter N-2. Si3N4 via Pyrolysis/Nitridation of SiC and Si-C-N Materials Chapter N-3. Si3N4 from Pyrolysis/Nitridation of Organosilicon Polymers Part O. Si3N4 Formation in Si-N-X Systems, X = B, P, S, Fe, Other Chapter O-1. Si3N4 Formation in Si-N-(B, P, S) Systems Chapter O-2. Si3N4In Situ Formation in Iron and Steel Alloys Chapter O-3. Si3N4 Preparation by Reactions of Fe-Si Alloys and N2 Chapter O-4. Si3N4 Formation in Non-Fe Metal-Silicon-Nitrogen Systems Index About the Author

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詳細情報

  • NII書誌ID(NCID)
    BA74985354
  • ISBN
    • 0878494928
  • 出版国コード
    sz
  • タイトル言語コード
    eng
  • 本文言語コード
    eng
  • 出版地
    Uetikon-Zuerich, Switzerland
  • ページ数/冊数
    x, 948 p.
  • 大きさ
    25 cm
  • 親書誌ID
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