Principles of physical vapor deposition of thin films

書誌事項

Principles of physical vapor deposition of thin films

K.S. Sree Harsha

Elsevier, 2006

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注記

Includes bibliographical references and index

内容説明・目次

内容説明

The goal of producing devices that are smaller, faster, more functional, reproducible, reliable and economical has given thin film processing a unique role in technology.Principles of Vapor Deposition of Thin Films brings in to one place a diverse amount of scientific background that is considered essential to become knowledgeable in thin film depostition techniques. Its ultimate goal as a reference is to provide the foundation upon which thin film science and technological innovation are possible.

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詳細情報

  • NII書誌ID(NCID)
    BA76872166
  • ISBN
    • 008044699X
  • 出版国コード
    ne
  • タイトル言語コード
    eng
  • 本文言語コード
    eng
  • 出版地
    Amsterdam ; Tokyo
  • ページ数/冊数
    xi, 1160 p.
  • 大きさ
    25 cm
  • 分類
  • 件名
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