Materials, technology and reliability of low-k dielectrics and copper interconnects : symposium held April 18-21, 2006, San Francisco, California, U.S.A.

著者

    • Materials, Technology and Reliability of Low-k Dielectrics and Cooper Interconnects
    • Tsui, Ting Y.

書誌事項

Materials, technology and reliability of low-k dielectrics and copper interconnects : symposium held April 18-21, 2006, San Francisco, California, U.S.A.

editors, Ting Y. Tsui ... [et al.]

（Materials Research Society symposium proceedings, v. 914）

Materials Research Society, c2006

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注記

"... Symposium F, "Materials, Technology and Reliability of Low-k Dielectrics and Cooper Interconnects," held April 18-21 at the 2006 MRS Spring Meeting in San Francisco, California ..."--Pref

Includes bibliographical references and indexes

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