Physics and technology of high-k gate dielectrics
著者
書誌事項
Physics and technology of high-k gate dielectrics
(ECS transactions, vol. 1,
Electrochemical Society, c2006-
- 3
- 4
- 5
- 6
- タイトル別名
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Dielectric and semiconductor materials, devices, and processing
大学図書館所蔵 件 / 全2件
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3E23400/1-5130946127,
4E23400/3-3130944345, 5E23400/11-4400000956, 6E23400/16-5400013322 -
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注記
v. 3: "... The Third International Symposium on High Dielectric Constant Gate Stacks, held in Los Angels, California, on October 17 -20, 2005. ..."--p. iii
v. 4: "... The Forth International Symposium on High Dielectric Constant Gate Stacks, to be held in Cancun, Mexico on October 30 to November 03, 2006. ..."--p. iii
v. 5:"... The Fifth International Symposium on High Dielectric Constant Materials and Gate Stacks, held in Washington, DC from October 8 to 10, 2007."--preface
v. 6:"... The sixth International Symposium on High Dielectric Constant Materials and Gate Stacks, held in Honolulu, Hawaii, October 13 to 15, 2008."--preface
v. 3: xi, 801 p. ; v. 4: xiv, 547 p. ; v. 5: xi, 660 p. ; v. 6: xv, 530 p.
Includes bibliographical references and indexes