EMLC 2006 : 22nd European Mask and Lithography Conference : 23-26 January 2006, Dresden, Germany

Author(s)

• European Mask and Lithography Conference
• Behringer, Uwe F. W.
• VDE/VDI-Gesellschaft für Mikroelektronik, Mikro- und Feinwerktechnik
• BACUS (Technical group)
• Society of Photo-optical Instrumentation Engineers

Bibliographic Information

EMLC 2006 : 22nd European Mask and Lithography Conference : 23-26 January 2006, Dresden, Germany

Uwe F.W. Behringer, chair/editor ; organized by VDE/VDI GMM--the Society for Microelectronics, Micro- and Precision Engineering (Germany) ; cooperating organizations, BACUS--the international technical group of SPIE dedicated to the advancement of photomask technology ... [et al.]

（Proceedings / SPIE -- the International Society for Optical Engineering, v. 6281）

SPIE, c2006

Note

Includes bibliographical references and author index

Details

• NCID: BA85710449
• ISBN:
  • 0819463566
• LCCN: 2006285647
• Country Code: us
• Title Language Code: eng
• Text Language Code: eng
• Place of Publication: Bellingham, Wash.,
• Pages/Volumes: 1 v. (various pagings)
• Size: 28 cm
• Classification:
  • LCC : TK7872.M3
  • DC22 : 621.3815
• Subject Headings:
  • LCSH : Integrated circuits -- Masks -- Congresses
  • LCSH : Microlithography -- Congresses
• Parent Bibliography ID:
  • BA0022700X