EMLC 2006 : 22nd European Mask and Lithography Conference : 23-26 January 2006, Dresden, Germany

著者

• European Mask and Lithography Conference
• Behringer, Uwe F. W.
• VDE/VDI-Gesellschaft für Mikroelektronik, Mikro- und Feinwerktechnik
• BACUS (Technical group)
• Society of Photo-optical Instrumentation Engineers

書誌事項

EMLC 2006 : 22nd European Mask and Lithography Conference : 23-26 January 2006, Dresden, Germany

Uwe F.W. Behringer, chair/editor ; organized by VDE/VDI GMM--the Society for Microelectronics, Micro- and Precision Engineering (Germany) ; cooperating organizations, BACUS--the international technical group of SPIE dedicated to the advancement of photomask technology ... [et al.]

（Proceedings / SPIE -- the International Society for Optical Engineering, v. 6281）

SPIE, c2006

注記

Includes bibliographical references and author index

詳細情報

• NII書誌ID(NCID): BA85710449
• ISBN:
  • 0819463566
• LCCN: 2006285647
• 出版国コード: us
• タイトル言語コード: eng
• 本文言語コード: eng
• 出版地: Bellingham, Wash.,
• ページ数/冊数: 1 v. (various pagings)
• 大きさ: 28 cm
• 分類:
  • LCC : TK7872.M3
  • DC22 : 621.3815
• 件名:
  • LCSH : Integrated circuits -- Masks -- Congresses
  • LCSH : Microlithography -- Congresses
• 親書誌ID:
  • BA0022700X