EMLC 2006 : 22nd European Mask and Lithography Conference : 23-26 January 2006, Dresden, Germany

著者

• European Mask and Lithography Conference
• Behringer, Uwe F. W.
• VDE/VDI-Gesellschaft für Mikroelektronik, Mikro- und Feinwerktechnik
• BACUS (Technical group)
• Society of Photo-optical Instrumentation Engineers

書誌事項

EMLC 2006 : 22nd European Mask and Lithography Conference : 23-26 January 2006, Dresden, Germany

Uwe F.W. Behringer, chair/editor ; organized by VDE/VDI GMM--the Society for Microelectronics, Micro- and Precision Engineering (Germany) ; cooperating organizations, BACUS--the international technical group of SPIE dedicated to the advancement of photomask technology ... [et al.]

（Proceedings / SPIE -- the International Society for Optical Engineering, v. 6281）

SPIE, c2006

注記

Includes bibliographical references and author index

内容説明・目次

内容説明

Proceedings of SPIE present the original research papers presented at SPIE conferences and other high-quality conferences in the broad-ranging fields of optics and photonics. These books provide prompt access to the latest innovations in research and technology in their respective fields. Proceedings of SPIE are among the most cited references in patent literature.

「Nielsen BookData」 より

詳細情報

• NII書誌ID(NCID): BA85710449
• ISBN:
  • 0819463566
• LCCN: 2006285647
• 出版国コード: us
• タイトル言語コード: eng
• 本文言語コード: eng
• 出版地: Bellingham, Wash.,
• ページ数/冊数: 1 v. (various pagings)
• 大きさ: 28 cm
• 分類:
  • LCC : TK7872.M3
  • DC22 : 621.3815
• 件名:
  • LCSH : Integrated circuits -- Masks -- Congresses
  • LCSH : Microlithography -- Congresses
• 親書誌ID:
  • BA0022700X