Photomask and X-ray mask technology VI : 13-14 April 1999, Yokohama, Japan

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Photomask and X-ray mask technology VI : 13-14 April 1999, Yokohama, Japan

Hiraoki Morimoto, editor ; sponsored by Photomask Japan, BACUS, [and] SPIE--the International Society for Optical Engineering ; cooperating organizations, Japan Society of Applied Physics ... [et al.]

(Proceedings / SPIE -- the International Society for Optical Engineering, v. 3748)

SPIE, c1999

  • : pbk

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Includes bibliographical references and author index

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    SPIE -- the International Society for Optical Engineering

    SPIE -- the International Society for Optical Engineering

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