Photomask and next-generation lithography mask technology XIV : 17-19 April 2007, Yokohama, Japan

Author(s)

• Photomask and Next-Generation Lithography Mask Technology
• Watanabe, Hidehiro
• Photomask Japan
• BACUS (Technical group)
• Society of Photo-optical Instrumentation Engineers

Bibliographic Information

Photomask and next-generation lithography mask technology XIV : 17-19 April 2007, Yokohama, Japan

Hidehiro Watanabe, editor ; sponsored by PMJ--Photomask Japan, BACUS--the international technical group of SPIE dedicated to the advancement of photomask technology, SPIE--the International Society for Optical Engineering

（Proceedings / SPIE -- the International Society for Optical Engineering, v. 6607）

SPIE, c2007

• : pt. 1

Other Title

Photomask and next-generation lithography mask technology 14

Photomask and next-generation lithography mask technology fourteen

Note

Includes bibliographical references and author index

"Part One of Two Parts"--T.p.

• NCID: BC02886817
• LCCN: 2007281758
• Country Code: us
• Title Language Code: eng
• Text Language Code: eng
• Place of Publication: Bellingham, Wash.
• Pages/Volumes: 1 v. (various pagings)
• Size: 28 cm
• Classification:
  • LCC : TK7872.M3
  • DC22 : 621.3815/31
• Subject Headings:
  • LCSH : Masks (Electronics) -- Congresses
  • LCSH : Integrated circuits -- Masks -- Congresses
  • LCSH : X-ray lithography -- Congresses
  • LCSH : Microlithography -- Congresses
  • LCSH : Optoelectronic devices -- Design and construction -- Congresses
• Parent Bibliography ID:
  • BA0022700X