Photomask and next-generation lithography mask technology XIV : 17-19 April 2007, Yokohama, Japan

著者

• Photomask and Next-Generation Lithography Mask Technology
• Watanabe, Hidehiro
• Photomask Japan
• BACUS (Technical group)
• Society of Photo-optical Instrumentation Engineers

書誌事項

Photomask and next-generation lithography mask technology XIV : 17-19 April 2007, Yokohama, Japan

Hidehiro Watanabe, editor ; sponsored by PMJ--Photomask Japan, BACUS--the international technical group of SPIE dedicated to the advancement of photomask technology, SPIE--the International Society for Optical Engineering

（Proceedings / SPIE -- the International Society for Optical Engineering, v. 6607）

SPIE, c2007

• : pt. 1

タイトル別名

Photomask and next-generation lithography mask technology 14

Photomask and next-generation lithography mask technology fourteen

注記

Includes bibliographical references and author index

"Part One of Two Parts"--T.p.

詳細情報

• NII書誌ID(NCID): BC02886817
• LCCN: 2007281758
• 出版国コード: us
• タイトル言語コード: eng
• 本文言語コード: eng
• 出版地: Bellingham, Wash.
• ページ数/冊数: 1 v. (various pagings)
• 大きさ: 28 cm
• 分類:
  • LCC : TK7872.M3
  • DC22 : 621.3815/31
• 件名:
  • LCSH : Masks (Electronics) -- Congresses
  • LCSH : Integrated circuits -- Masks -- Congresses
  • LCSH : X-ray lithography -- Congresses
  • LCSH : Microlithography -- Congresses
  • LCSH : Optoelectronic devices -- Design and construction -- Congresses
• 親書誌ID:
  • BA0022700X