Photomask and X-ray mask technology II : 20-21 April 1995, Kawasaki City, Kanagawa, Japan

著者

• Symposium on Photomask and X-Ray Mask Technology
• Photomask Japan
• 吉原, 英夫 ヨシハラ, ヒデオ
• BACUS (Technical group)
• Society of Photo-optical Instrumentation Engineers

書誌事項

Photomask and X-ray mask technology II : 20-21 April 1995, Kawasaki City, Kanagawa, Japan

Hideo Yoshihara, editor ; sponsored by Photomask Japan, BACUS, SPIE--the International Society for Optical Engineering ; cosponsored by Japan Chapter of SPIE ... [et al.]

（Proceedings / SPIE -- the International Society for Optical Engineering, v. 2512）

SPIE, c1995

注記

Includes bibliographic references and author index

詳細情報

• NII書誌ID(NCID): BC06577698
• ISBN:
  • 0819418706
• LCCN: 95067866
• 出版国コード: us
• タイトル言語コード: eng
• 本文言語コード: eng
• 出版地: Bellingham, Wash.
• ページ数/冊数: xi, 554 p.
• 大きさ: 28 cm
• 分類:
  • LCC : TK7872.M3
  • DC20 : 621.3815/31
• 件名:
  • LCSH : Integrated circuits -- Masks -- Congresses
  • LCSH : X-ray lithography -- Congresses
  • LCSH : Microlithography -- Congresses
• 親書誌ID:
  • BA0022700X