Photomask and X-ray mask technology II : 20-21 April 1995, Kawasaki City, Kanagawa, Japan

Author(s)

• Symposium on Photomask and X-Ray Mask Technology
• Photomask Japan
• 吉原, 英夫 ヨシハラ, ヒデオ
• BACUS (Technical group)
• Society of Photo-optical Instrumentation Engineers

Bibliographic Information

Photomask and X-ray mask technology II : 20-21 April 1995, Kawasaki City, Kanagawa, Japan

Hideo Yoshihara, editor ; sponsored by Photomask Japan, BACUS, SPIE--the International Society for Optical Engineering ; cosponsored by Japan Chapter of SPIE ... [et al.]

（Proceedings / SPIE -- the International Society for Optical Engineering, v. 2512）

SPIE, c1995

Note

Includes bibliographic references and author index

Details

• NCID: BC06577698
• ISBN:
  • 0819418706
• LCCN: 95067866
• Country Code: us
• Title Language Code: eng
• Text Language Code: eng
• Place of Publication: Bellingham, Wash.
• Pages/Volumes: xi, 554 p.
• Size: 28 cm
• Classification:
  • LCC : TK7872.M3
  • DC20 : 621.3815/31
• Subject Headings:
  • LCSH : Integrated circuits -- Masks -- Congresses
  • LCSH : X-ray lithography -- Congresses
  • LCSH : Microlithography -- Congresses
• Parent Bibliography ID:
  • BA0022700X