Metrology, inspection, and process control for microlithography X : 11-13 March, 1996, Santa Clara, California

Author(s)

• Jones, Susan K.
• Society of Photo-optical Instrumentation Engineers
• SPIE Conference on Metrology, Inspection, and Process Control for Microlithography

Bibliographic Information

Metrology, inspection, and process control for microlithography X : 11-13 March, 1996, Santa Clara, California

sponsored and published by SPIE--the International Society for Optical Engineering ; Susan K. Jones, chair/editor

（Proceedings / SPIE -- the International Society for Optical Engineering, v. 2725）

SPIE, 1996

• pbk.

Other Title

Metrology, inspection, and process control for microlithography 10

Note

"This volume contains the origianl papers presented at the tenth annual SPIE Conference on Metrology, Inspection, and Process Control for Microlithography"--Introd

Includes bibliographical references

Details

• NCID: BC06662844
• ISBN:
  • 0819421014
• LCCN: 95072314
• Country Code: us
• Title Language Code: eng
• Text Language Code: eng
• Place of Publication: Bellingham, WA
• Pages/Volumes: xiii, 802 p.
• Size: 28 cm
• Classification:
  • LCC : TK7874
  • DC21 : 621.3815
• Subject Headings:
  • LCSH : Integrated circuits -- Inspection -- Congresses
  • LCSH : Integrated circuits -- Measurement -- Congresses
  • LCSH : Microlithography -- Congresses
• Parent Bibliography ID:
  • BA0022700X