Metrology, inspection, and process control for microlithography X : 11-13 March, 1996, Santa Clara, California

著者

• Jones, Susan K.
• Society of Photo-optical Instrumentation Engineers
• SPIE Conference on Metrology, Inspection, and Process Control for Microlithography

書誌事項

Metrology, inspection, and process control for microlithography X : 11-13 March, 1996, Santa Clara, California

sponsored and published by SPIE--the International Society for Optical Engineering ; Susan K. Jones, chair/editor

（Proceedings / SPIE -- the International Society for Optical Engineering, v. 2725）

SPIE, 1996

• pbk.

タイトル別名

Metrology, inspection, and process control for microlithography 10

注記

"This volume contains the origianl papers presented at the tenth annual SPIE Conference on Metrology, Inspection, and Process Control for Microlithography"--Introd

Includes bibliographical references

詳細情報

• NII書誌ID(NCID): BC06662844
• ISBN:
  • 0819421014
• LCCN: 95072314
• 出版国コード: us
• タイトル言語コード: eng
• 本文言語コード: eng
• 出版地: Bellingham, WA
• ページ数/冊数: xiii, 802 p.
• 大きさ: 28 cm
• 分類:
  • LCC : TK7874
  • DC21 : 621.3815
• 件名:
  • LCSH : Integrated circuits -- Inspection -- Congresses
  • LCSH : Integrated circuits -- Measurement -- Congresses
  • LCSH : Microlithography -- Congresses
• 親書誌ID:
  • BA0022700X