Photomask and X-ray mask technology III : 18-19 April, 1996, Kawasaki City, Kanagawa, Japan

Author(s)

• Photomask and X-ray Mask Technology (Conference)
• Yoshihara, Hideo
• Photomask Japan
• BACUS (Technical group)
• Society of Photo-optical Instrumentation Engineers. Japan Chapter

Bibliographic Information

Photomask and X-ray mask technology III : 18-19 April, 1996, Kawasaki City, Kanagawa, Japan

Hideo Yoshihara, editor ; sponsored by Photomask Japan, BACUS, SPIE--the International Society for Optical Engineering

（Proceedings / SPIE -- the International Society for Optical Engineering, v. 2793）

SPIE, c1996

Other Title

Photomask and X-ray mask technology 3

Note

Includes bibliographic references and index

Details

• NCID: BC06822204
• ISBN:
  • 0819421790
• LCCN: 96067849
• Country Code: us
• Title Language Code: eng
• Text Language Code: eng
• Place of Publication: Bellingham, Wash.
• Pages/Volumes: xiii, 530 p.
• Size: 28 cm
• Classification:
  • LCC : TK7872.M3
  • DC21 : 621.3815/31
• Subject Headings:
  • LCSH : Masks (Electronics) -- Congresses
  • LCSH : Integrated circuits -- Masks -- Congresses
  • LCSH : X-ray lithography -- Congresses
  • LCSH : Microlithography -- Congresses
• Parent Bibliography ID:
  • BA0022700X