Photomask and X-ray mask technology III : 18-19 April, 1996, Kawasaki City, Kanagawa, Japan

著者

• Photomask and X-ray Mask Technology (Conference)
• Yoshihara, Hideo
• Photomask Japan
• BACUS (Technical group)
• Society of Photo-optical Instrumentation Engineers. Japan Chapter

書誌事項

Photomask and X-ray mask technology III : 18-19 April, 1996, Kawasaki City, Kanagawa, Japan

Hideo Yoshihara, editor ; sponsored by Photomask Japan, BACUS, SPIE--the International Society for Optical Engineering

（Proceedings / SPIE -- the International Society for Optical Engineering, v. 2793）

SPIE, c1996

タイトル別名

Photomask and X-ray mask technology 3

注記

Includes bibliographic references and index

詳細情報

• NII書誌ID(NCID): BC06822204
• ISBN:
  • 0819421790
• LCCN: 96067849
• 出版国コード: us
• タイトル言語コード: eng
• 本文言語コード: eng
• 出版地: Bellingham, Wash.
• ページ数/冊数: xiii, 530 p.
• 大きさ: 28 cm
• 分類:
  • LCC : TK7872.M3
  • DC21 : 621.3815/31
• 件名:
  • LCSH : Masks (Electronics) -- Congresses
  • LCSH : Integrated circuits -- Masks -- Congresses
  • LCSH : X-ray lithography -- Congresses
  • LCSH : Microlithography -- Congresses
• 親書誌ID:
  • BA0022700X