Optical characterization techniques for high-performance microelectronic device manufacturing III : 16-17 October 1996, Austin, Texas

Author(s)

• Optical Characterization Techniques for High-Performance Microelectronic Device Manufacturing (Symposium)
• DeBusk, Damon
• Chen, Ray T.
• Society of Photo-optical Instrumentation Engineers
• Semiconductor Equipment and Materials International

Bibliographic Information

Optical characterization techniques for high-performance microelectronic device manufacturing III : 16-17 October 1996, Austin, Texas

Damon DeBusk, Ray T. Chen, chairs/editors ; sponsored and published by SPIE--The International Society for Optical Engineering ; cooperating organizations, SEMI--Semiconductor Equipment and Materials International ... [et al.]

（Proceedings / SPIE -- the International Society for Optical Engineering, v. 2877）

SPIE, c1996

Other Title

Optical characterization techniques for high-performance microelectronic device manufacturing 3

Note

Includes bibliographical references and index

Details

• NCID: BC06860076
• ISBN:
  • 0819422754
• LCCN: 96069472
• Country Code: us
• Title Language Code: eng
• Text Language Code: eng
• Place of Publication: Bellingham, Wash.
• Pages/Volumes: ix, 218 p.
• Size: 28 cm
• Classification:
  • LCC : TK7836
  • DC22 : 621.3815/2
• Subject Headings:
  • LCSH : Integrated circuits industry -- Congresses
  • LCSH : Manufacturing processes -- Congresses
  • LCSH : Semiconductors -- Design and construction -- Congresses
  • LCSH : Integrated circuits -- Design and construction -- Congresses
  • LCSH : Semiconductors -- Testing -- Optical methods -- Congresses
  • LCSH : Optical detectors -- Congresses
• Parent Bibliography ID:
  • BA0022700X