In-line characterization techniques for performance and yield enhancement in microelectronic manufacturing : 1-2 October 1997, Austin, Texas

著者

• DeBusk, Damon
• Ajuria, Sergio
• Society of Photo-optical Instrumentation Engineers
• Semiconductor Equipment and Materials International
• Solid State Technology (Organization)
• Electrochemical Society

書誌事項

In-line characterization techniques for performance and yield enhancement in microelectronic manufacturing : 1-2 October 1997, Austin, Texas

Damon K. DeBusk, Sergio Ajuria, chairs/editors ; sponsored and published by SPIE--The International Society for Optical Engineering ; cooperating organizations, SEMI--Semiconductor Equipment and Materials International, Solid State Technology, the Electrochemical Society

（Proceedings / SPIE -- the International Society for Optical Engineering, v. 3215）

SPIE, c1997

タイトル別名

In line characterization techniques for performance and yield enhancement in microelectronic manufacturing

注記

Includes bibliographical references and author index

• NII書誌ID(NCID): BC06945645
• ISBN:
  • 0819426474
• LCCN: 98125245
• 出版国コード: us
• タイトル言語コード: eng
• 本文言語コード: eng
• 出版地: Bellingham, Wash., USA
• ページ数/冊数: v, 186 p.
• 大きさ: 28 cm
• 分類:
  • LCC : TK7871.85
  • DC21 : 621.3815
• 件名:
  • LCSH : Integrated circuits -- Design and construction -- Congresses
  • LCSH : Semiconductors -- Design and construction -- Congresses
  • LCSH : Optical pattern recognition -- Congresses
  • LCSH : Manufacturing processes -- Congresses
• 親書誌ID:
  • BA0022700X