In-line characterization techniques for performance and yield enhancement in microelectronic manufacturing : 1-2 October 1997, Austin, Texas

Author(s)

• DeBusk, Damon
• Ajuria, Sergio
• Society of Photo-optical Instrumentation Engineers
• Semiconductor Equipment and Materials International
• Solid State Technology (Organization)
• Electrochemical Society

Bibliographic Information

In-line characterization techniques for performance and yield enhancement in microelectronic manufacturing : 1-2 October 1997, Austin, Texas

Damon K. DeBusk, Sergio Ajuria, chairs/editors ; sponsored and published by SPIE--The International Society for Optical Engineering ; cooperating organizations, SEMI--Semiconductor Equipment and Materials International, Solid State Technology, the Electrochemical Society

（Proceedings / SPIE -- the International Society for Optical Engineering, v. 3215）

SPIE, c1997

Other Title

In line characterization techniques for performance and yield enhancement in microelectronic manufacturing

Note

Includes bibliographical references and author index

Details

• NCID: BC06945645
• ISBN:
  • 0819426474
• LCCN: 98125245
• Country Code: us
• Title Language Code: eng
• Text Language Code: eng
• Place of Publication: Bellingham, Wash., USA
• Pages/Volumes: v, 186 p.
• Size: 28 cm
• Classification:
  • LCC : TK7871.85
  • DC21 : 621.3815
• Subject Headings:
  • LCSH : Integrated circuits -- Design and construction -- Congresses
  • LCSH : Semiconductors -- Design and construction -- Congresses
  • LCSH : Optical pattern recognition -- Congresses
  • LCSH : Manufacturing processes -- Congresses
• Parent Bibliography ID:
  • BA0022700X