17th Annual Symposium on Photomask Technology and Management : [proceedings] : 17-19 September, 1997, Redwood City, California

Author(s)

• Symposium on Photomask Technology and Management
• Reynolds, James A.
• Grenon, Brian J.
• BACUS (Technical group)
• Society of Photo-optical Instrumentation Engineers

Bibliographic Information

17th Annual Symposium on Photomask Technology and Management : [proceedings] : 17-19 September, 1997, Redwood City, California

James A Reynolds, Brian J. Grenon, chairs/editors ; sponsored by BACUS--the International Technical Group of SPIE dedicated to the advancement of photomask technology

（Proceedings / SPIE -- the International Society for Optical Engineering, v. 3236）

SPIE, c1998

Other Title

17th Annual BACUS Symposium on Photomask Technology and Management

Note

Includes bibliographical references and index

Details

• NCID: BC06946626
• ISBN:
  • 0819426695
• LCCN: 98184513
• Country Code: us
• Title Language Code: eng
• Text Language Code: eng
• Place of Publication: Bellingham, Washington
• Pages/Volumes: ix, 554 p.
• Size: 28 cm
• Classification:
  • LCC : TK7874
  • DC21 : 621.3815/31
• Subject Headings:
  • LCSH : Integrated circuits -- Masks -- Congresses
  • LCSH : Microlithography -- Congresses
• Parent Bibliography ID:
  • BA0022700X