17th Annual Symposium on Photomask Technology and Management : [proceedings] : 17-19 September, 1997, Redwood City, California

著者

• Symposium on Photomask Technology and Management
• Reynolds, James A.
• Grenon, Brian J.
• BACUS (Technical group)
• Society of Photo-optical Instrumentation Engineers

書誌事項

17th Annual Symposium on Photomask Technology and Management : [proceedings] : 17-19 September, 1997, Redwood City, California

James A Reynolds, Brian J. Grenon, chairs/editors ; sponsored by BACUS--the International Technical Group of SPIE dedicated to the advancement of photomask technology

（Proceedings / SPIE -- the International Society for Optical Engineering, v. 3236）

SPIE, c1998

タイトル別名

17th Annual BACUS Symposium on Photomask Technology and Management

注記

Includes bibliographical references and index

詳細情報

• NII書誌ID(NCID): BC06946626
• ISBN:
  • 0819426695
• LCCN: 98184513
• 出版国コード: us
• タイトル言語コード: eng
• 本文言語コード: eng
• 出版地: Bellingham, Washington
• ページ数/冊数: ix, 554 p.
• 大きさ: 28 cm
• 分類:
  • LCC : TK7874
  • DC21 : 621.3815/31
• 件名:
  • LCSH : Integrated circuits -- Masks -- Congresses
  • LCSH : Microlithography -- Congresses
• 親書誌ID:
  • BA0022700X