18th Annual Symposium on Photomask Technology and Management : [proceedings] : 16-18 September, 1998, Redwood City, California

著者

• Symposium on Photomask Technology and Management
• Grenon, Brian J.
• Abboud, Frank E.
• BACUS (Technical group)
• Society of Photo-optical Instrumentation Engineers

書誌事項

18th Annual Symposium on Photomask Technology and Management : [proceedings] : 16-18 September, 1998, Redwood City, California

Brian J. Grenon, Frank E. Abboud, chairs/editors ; sponsored by BACUS--the International Technical Group of SPIE dedicated to the advancement of photomask technology ; published by SPIE--the International Society for Optical Engineering

（Proceedings / SPIE -- the International Society for Optical Engineering, v. 3546）

SPIE, c1998

注記

Includes bibliographic references and author index

詳細情報

• NII書誌ID(NCID): BC07260824
• ISBN:
  • 0819430072
• LCCN: 00703281
• 出版国コード: us
• タイトル言語コード: eng
• 本文言語コード: eng
• 出版地: Bellingham, Washington
• ページ数/冊数: xiii, 672 p.
• 大きさ: 28 cm
• 分類:
  • LCC : TK7874
  • DC21 : 621.3815/31
• 件名:
  • LCSH : Integrated circuits -- Masks -- Congresses
  • LCSH : Microlithography -- Congresses
• 親書誌ID:
  • BA0022700X