Photomask and next-generation lithography mask technology VII : 12-13 April 2000, Yokohama, Japan

Author(s)

• Photomask Japan
• Morimoto, Hiraoki
• BACUS (Technical group)
• Society of Photo-optical Instrumentation Engineers
• 応用物理学会 オウヨウ ブツリ ガッカイ
• 精密工学会 セイミツ コウガッカイ
• 電気学会 デンキ ガッカイ
• SEMIジャパン SEMI ジャパン

Bibliographic Information

Photomask and next-generation lithography mask technology VII : 12-13 April 2000, Yokohama, Japan

Hiroaki [i.e. Hiraoki] Morimoto, editor ; sponsored by Photomask Japan, BACUS, [and] SPIE--the International Society for Optical Engineering ; cooperating organizations for symposium, Japan Society of Applied Physics, Japan Society for Precision Engineering, [and] Institute of Electrical Engineers of Japan ; cooperating organization for technical exhibit, SEMI Japan

（Proceedings / SPIE -- the International Society for Optical Engineering, v. 4066）

SPIE, c2000

Other Title

Photomask and next generation lithography mask technology 7

Photomask and x-ray mask technology

Note

Earlier proceedings have title: Photomask and X-ray mask technology

Includes bibliographical references and index

Details

• NCID: BC07470532
• ISBN:
  • 0819437026
• LCCN: 2001267210
• Country Code: us
• Title Language Code: eng
• Text Language Code: eng
• Place of Publication: Bellingham, Wash., USA
• Pages/Volumes: xv, 750 p.
• Size: 28 cm
• Classification:
  • LCC : TK7872.M3
  • DC21 : 621.3815/31
• Subject Headings:
  • LCSH : Masks (Electronics) -- Congresses
  • LCSH : Integrated circuits -- Masks -- Congresses
  • LCSH : X-ray lithography -- Congresses
  • LCSH : Microlithography -- Congresses
  • LCSH : Optoelectronic devices -- Design and construction -- Congresses
• Parent Bibliography ID:
  • BA0022700X