Photomask and next-generation lithography mask technology VII : 12-13 April 2000, Yokohama, Japan

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書誌事項

Photomask and next-generation lithography mask technology VII : 12-13 April 2000, Yokohama, Japan

Hiroaki [i.e. Hiraoki] Morimoto, editor ; sponsored by Photomask Japan, BACUS, [and] SPIE--the International Society for Optical Engineering ; cooperating organizations for symposium, Japan Society of Applied Physics, Japan Society for Precision Engineering, [and] Institute of Electrical Engineers of Japan ; cooperating organization for technical exhibit, SEMI Japan

（Proceedings / SPIE -- the International Society for Optical Engineering, v. 4066）

SPIE, c2000

タイトル別名

Photomask and next generation lithography mask technology 7

Photomask and x-ray mask technology

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注記

Earlier proceedings have title: Photomask and X-ray mask technology

Includes bibliographical references and index

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  • Proceedings

    SPIE -- the International Society for Optical Engineering

    SPIE -- the International Society for Optical Engineering

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