Photomask and next-generation lithography mask technology VIII : 25-27 April 2001, Yokohama, Japan

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書誌事項

Photomask and next-generation lithography mask technology VIII : 25-27 April 2001, Yokohama, Japan

Hiroichi Kawahira, editor ; sponsored by PMJ--Photomask Japan, BACUS, [and] SPIE--the International Society for Optical Engineering ; cooperating organizations for symposium, the Japan Society of Applied Physics ... [et al.] ; supported by Yokohama City

（Proceedings / SPIE -- the International Society for Optical Engineering, v. 4409）

SPIE, c2001

タイトル別名

Photomask and X-ray mask technology

Photomask and next-generation lithography mask technology 8

Photomask and next generation lithography mask technology

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注記

Some earlier proceedings have title: Photomask and X-ray mask technology

Includes bibliographical references and index

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  • Proceedings

    SPIE -- the International Society for Optical Engineering

    SPIE -- the International Society for Optical Engineering

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