Photomask and next-generation lithography mask technology IX : 23-25 April, 2002, Yokohama, Japan

Author(s)

• Photomask Japan (Conference)
• Kawahira, Hiroichi
• Photomask Japan
• BACUS (Technical group)
• 応用物理学会 オウヨウ ブツリ ガッカイ
• SEMIジャパン SEMI ジャパン
• Society of Photo-optical Instrumentation Engineers

Bibliographic Information

Photomask and next-generation lithography mask technology IX : 23-25 April, 2002, Yokohama, Japan

Hiroichi Kawahira, editor ; sponsored by PMJ--Photomask Japan, BACUS, [and] SPIE--the International Society for Optical Engineering ; cooperating organizations for the symposium, the Japan Society of Applied Physics ... [et al.] ; cooperating organization for technical exhibit, SEMI Japan ; supported by Yokohama City ; published by SPIE--the International Society for Optical Engineering

（Proceedings / SPIE -- the International Society for Optical Engineering, v. 4754）

SPIE, c2001

Other Title

Photomask and X-ray mask technology

Photomask and next-generation lithography mask technology 9

Photomask and next generation lithography mask technology

Note

Some earlier proceedings have title: Photomask and X-ray mask technology

Includes bibliographical references and author index

Description and Table of Contents

Description

This text examines photomask and next-generation lithography mask technology.

by "Nielsen BookData"

Details

• NCID: BC07734951
• ISBN:
  • 0819445177
• LCCN: 2004272510
• Country Code: us
• Title Language Code: eng
• Text Language Code: eng
• Place of Publication: Bellingham, Wash.
• Pages/Volumes: xxx, 918 p.
• Size: 28 cm
• Classification:
  • LCC : TK7878
  • DC22 : 621.3815/31
• Subject Headings:
  • LCSH : Masks (Electronics) -- Congresses
  • LCSH : Integrated circuits -- Masks -- Congresses
  • LCSH : X-ray lithography -- Congresses
  • LCSH : Microlithography -- Congresses
  • LCSH : Optoelectronic devices -- Design and construction -- Congresses
• Parent Bibliography ID:
  • BA0022700X