Photomask and next-generation lithography mask technology X : 16-18 April, 2003, Yokohama, Japan

著者

書誌事項

Photomask and next-generation lithography mask technology X : 16-18 April, 2003, Yokohama, Japan

Hiroyoshi Tanabe, editor ; sponsored by PMJ--Photomask Japan, BACUS--the international technical group of SPIE dedicated to the advancement of photomask technology, [and] SPIE--the International Society for Optical Engineering ; cooperating organizations for symposium, the Japan Society of Applied Physics ... [et al.] ; cooperating organization for technical exhibit, SEMI Japan ; supported by Yokohama City ; published by SPIE--the International Society for Optical Engineering

（Proceedings / SPIE -- the International Society for Optical Engineering, v. 5130）

SPIE, c2003

タイトル別名

Photomask and X-ray mask technology

Photomask and next-generation lithography mask technology 10

Photomask and next generation lithography mask technology

大学図書館所蔵 件 / 全1件

この図書・雑誌をさがす

注記

Some earlier proceedings have title: Photomask and X-ray mask technology

Includes bibliographical references and author index

関連文献： 1件中  1-1を表示

  • Proceedings

    SPIE -- the International Society for Optical Engineering

    SPIE -- the International Society for Optical Engineering

詳細情報

ページトップへ