EMLC 2008 : 24th European Mask and Lithography Conference : 21-24 January 2008, Dresden, Germany

Author(s)

• European Mask and Lithography Conference
• Behringer, Uwe F. W.
• Maurer, Wilhelm
• Waelpoel, Jacques
• VDE/VDI GMM. Society for Microelectronics, Micro- and Precision Engineering
• BACUS (Technical group)
• Society of Photo-optical Instrumentation Engineers

Bibliographic Information

EMLC 2008 : 24th European Mask and Lithography Conference : 21-24 January 2008, Dresden, Germany

Uwe F.W. Behringer, chair/editor ; Wilhelm Maurer, Jacques Waelpoel, program chairs ; organized by VDE/VDI GMM--the Society for Microelectronics, Micro- and Precision Engineering (Germany) ; cooperating organizations, BACUS ... [et al.]

（Proceedings / SPIE -- the International Society for Optical Engineering, v. 6792）

SPIE, c2008

Other Title

European Mask and Lithography Conference 2008

24th European Mask and Lithography Conference

Note

Includes bibliographical references and author index

Details

• NCID: BC16222349
• ISBN:
  • 9780819469564
• LCCN: 2010287113
• Country Code: us
• Title Language Code: eng
• Text Language Code: eng
• Place of Publication: Bellingham, Wash.,
• Pages/Volumes: 1 v. (various pagings)
• Size: 28 cm
• Classification:
  • LCC : TK7872.M3
• Subject Headings:
  • LCSH : Integrated circuits -- Masks -- Congresses
  • LCSH : Microlithography -- Congresses
• Parent Bibliography ID:
  • BA0022700X