EMLC 2008 : 24th European Mask and Lithography Conference : 21-24 January 2008, Dresden, Germany

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EMLC 2008 : 24th European Mask and Lithography Conference : 21-24 January 2008, Dresden, Germany

Uwe F.W. Behringer, chair/editor ; Wilhelm Maurer, Jacques Waelpoel, program chairs ; organized by VDE/VDI GMM--the Society for Microelectronics, Micro- and Precision Engineering (Germany) ; cooperating organizations, BACUS ... [et al.]

（Proceedings / SPIE -- the International Society for Optical Engineering, v. 6792）

SPIE, c2008

タイトル別名

European Mask and Lithography Conference 2008

24th European Mask and Lithography Conference

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Includes bibliographical references and author index

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内容説明

Proceedings of SPIE present the original research papers presented at SPIE conferences and other high-quality conferences in the broad-ranging fields of optics and photonics. These books provide prompt access to the latest innovations in research and technology in their respective fields. Proceedings of SPIE are among the most cited references in patent literature.

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    SPIE -- the International Society for Optical Engineering

    SPIE -- the International Society for Optical Engineering

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