Materials for microlithography : radiation-sensitive polymers

著者

• Thompson, L. F.
• Willson, C. G. (C. Grant)
• Fréchet, J. M. J.
• American Chemical Society. Division of Polymeric Materials : Science and Engineering
• American Chemical Society. Division of Polymer Chemistry
• American Chemical Society. Meeting (187th : 1984 : St. Louis, Mo.)

書誌事項

Materials for microlithography : radiation-sensitive polymers

L.F. Thompson, editor, C.G. Willson, editor, J.M.J. Fréchet, editor ; based on a symposium cosponsored by the Division of Polymeric Materials, Science and Engineering and the Division of Polymer Chemistry, at the 187th Meeting of the American Chemical Society, St. Louis, Missouri, April 8-13, 1984

（ACS symposium series, 266）

The Society, 1984

タイトル別名

Radiation-sensitive polymers

注記

Includes bibliographies and indexes

詳細情報

• NII書誌ID(NCID): BA03230678
• ISBN:
  • 0841208719
• LCCN: 84021744
• 出版国コード: us
• タイトル言語コード: eng
• 本文言語コード: eng
• 出版地: Washington, D.C.
• ページ数/冊数: viii, 494 p.
• 大きさ: 24 cm
• 分類:
  • LCC : TK7871.15.P6
  • DC19 : 621.381/73
• 件名:
  • LCSH : Polymers and polymerization -- Congresses
  • LCSH : Photoresists -- Congresses
  • LCSH : Microlithography -- Materials -- Congresses
  • LCSH : Microelectronics -- Materials -- Congresses
• 親書誌ID:
  • BA00073096