Nanolithography : a borderland between STM, EB, IB, and X-ray lithographies
Author(s)
Bibliographic Information
Nanolithography : a borderland between STM, EB, IB, and X-ray lithographies
（NATO ASI series, ser. E . Applied sciences ; v. 264）
Kluwer Academic Publishers, 1994
Available at 9 libraries
Note
"Proceedings of the NATO Advanced Research Workshop on Nanolithography: a Borderland between STM, EB, IB, and X-Ray Lithographies, Frascati, Roma, Italy, April 6-8, 1993"--T.p. verso
"Published in cooperation with NATO Scientific Affairs Division."
Includes index
Description and Table of Contents
Description
Success in the fabrication of structures at the nanometer length scale has opened up a new horizon to condensed matter physics: the study of quantum phenomena in confined boxes, wires, rings, etc. A new class of electronic devices based on this physics has been proposed, with the promise of a new functionality for ultrafast and/or ultradense electronic circuits. Such applications demand highly sophisticated fabrication techniques, the crucial one being lithography.
Nanolithography contains updated reviews by major experts on the well established techniques -- electron beam lithography (EBL), X-ray lithography (XRL), ion beam lithography (IBL) -- as well as on emergent techniques, such as scanning tunnelling lithography (STL).
Table of Contents
- Preface. Electron Beam Lithography. Nanolithography, the Integrated System
- F.J. Hohn. Electron Beam Resists and Pattern Transfer Methods
- M. Hatzakis. Nanolithography developed through Electron-Beam-Induced Surface Reaction
- S. Matsui, Y. Ochiai, M. Baba, H. Watanabe. Direct Writing of Nanoscale Patterns in SiO2
- X. Pan, A.N. Broers. Sub-10 nm Electron Beam Lithography: -AIF-Doped Lithium Fluoride as a Resist
- W. Langheinrich, H. Beneking. Surface Imaging for EB-Nanolithography
- M. Boettcher, L. Bauch, A. Wolff, W. Hoeppner. Patterning of InGaAs/GaAs Quantum Dots Using E-Beam Lithography and Selective Removal of the Top Barrier
- A. Schmidt, F. Faller, A. Forchel. Fabrication of Ultrasmall InGaAs/InP Nanostructures by High Voltage Electron Beam Lithography and Wet Chemical Etching
- P. Ils, M. Michel, A. Forchel, I. Gyuro, P. Speier, E. Zielinski. Fabrication, Investigation and Manipulation of Artificial Nanostructures
- A. Menschig, F.E. Prins, G. Lehr, R. Bergmann, J. Hommel, U.A. Griesinger, V. Harle, F. Scholz, H. Schweizer. Nano-Lithography in 3 Dimensions with Electron Beam Induced Deposition
- H.W.P. Koops, M. Rudolph, J. Kretz, M. Weber. Nanolithography Requirements -- an Equipment Manufacturer's View
- B.A. Wallman, G. Crawley. X-Ray Lithography. X-Ray Nanolithography: Limits, and Applications to Sub-100 nm Manufacturing
- H.I. Smith, M.L. Schattenburg. X-Ray Phase Shifting Masks
- F. Cerrina, J. Xiao, Z.Y. Guo. Fabrication of X-Ray Mask for Nanolithography by EBL
- M. Gentili. Ion Beam Lithography. Intense Focused Ion Beams for Nanostructurisation
- S. Kalbitzer, Ch. Wilbertz, Th. Miller. Latest Results Obtained with the Alpha IonProjection Machine
- W. Fallmann, A. Bruckner, E. Cekan, W. Friza, F. Paschke, G. Stangl, F. Thalinger, H. Loeschner, G. Stengl, P. Hudek. STM Lithography. Direct Writing with a Combined STM/SEM System
- A.L. de Lozanne, W.F. Smith, E.E. Ehrichs. Low Voltage e-Beam Lithography with the Scanning Tunneling Microscope
- C.R.K. Marrian, F.K. Perkins, S.L. Brandow, T.S. Koloski, E.A. Dobisz, J.M. Calvert. STM Nanolithography and Characterization of Passivated Silicon and Gallium Arsenide
- J.A. Dagata. Sub-20 nm Lithographic Patterning with the STM
- L. Stockman, C. Van Haesendonck, G. Neuttiens, Y. Bruynseraede. Lithography of YBa2Cu3O7 Superconducting Thin Films with a Scanning Tunneling Microscope
- I. Heyvaert, E. Osquiguil, C. Van Haesendonck, Y. Bruynseraede. Author Index. Subject Index.
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