13th Annual Symposium on Photomask Technology and Management : 22-23 September 1993, Santa Clara, California

Author(s)

• BACUS (Technical group)

Bibliographic Information

13th Annual Symposium on Photomask Technology and Management : 22-23 September 1993, Santa Clara, California

sponsored by BACUS--the International Technical Group of SPIE dedicated to the advancement of photomask technology

（Proceedings / SPIE -- the International Society for Optical Engineering, v. 2087）

SPIE, c1994

• pbk.

Other Title

Thirteenth Annual Symposium on Photomask Technology and Management

Details

• NCID: BA24472063
• ISBN:
  • 0819413569
• LCCN: 93086691
• Country Code: us
• Title Language Code: eng
• Text Language Code: eng
• Place of Publication: Bellingham, Wash.
• Pages/Volumes: ix, 422 p.
• Size: 28 cm
• Classification:
  • LCC : TK7874
  • DC20 : 621.3815/31
• Subject Headings:
  • LCSH : Integrated circuits -- Masks -- Congresses
  • LCSH : Microlithography -- Congresses
• Parent Bibliography ID:
  • BA0022700X