13th Annual Symposium on Photomask Technology and Management : 22-23 September 1993, Santa Clara, California

著者

• BACUS (Technical group)

書誌事項

13th Annual Symposium on Photomask Technology and Management : 22-23 September 1993, Santa Clara, California

sponsored by BACUS--the International Technical Group of SPIE dedicated to the advancement of photomask technology

（Proceedings / SPIE -- the International Society for Optical Engineering, v. 2087）

SPIE, c1994

• pbk.

タイトル別名

Thirteenth Annual Symposium on Photomask Technology and Management

詳細情報

• NII書誌ID(NCID): BA24472063
• ISBN:
  • 0819413569
• LCCN: 93086691
• 出版国コード: us
• タイトル言語コード: eng
• 本文言語コード: eng
• 出版地: Bellingham, Wash.
• ページ数/冊数: ix, 422 p.
• 大きさ: 28 cm
• 分類:
  • LCC : TK7874
  • DC20 : 621.3815/31
• 件名:
  • LCSH : Integrated circuits -- Masks -- Congresses
  • LCSH : Microlithography -- Congresses
• 親書誌ID:
  • BA0022700X