In-line characterization techniques for performance and yield enhancement in microelectronic manufacturing : 1-2 October 1997, Austin, Texas

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In-line characterization techniques for performance and yield enhancement in microelectronic manufacturing : 1-2 October 1997, Austin, Texas

Damon K. DeBusk, Sergio Ajuria, chairs/editors ; sponsored and published by SPIE--The International Society for Optical Engineering ; cooperating organizations, SEMI--Semiconductor Equipment and Materials International, Solid State Technology, the Electrochemical Society

（Proceedings / SPIE -- the International Society for Optical Engineering, v. 3215）

SPIE, c1997

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In line characterization techniques for performance and yield enhancement in microelectronic manufacturing

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Includes bibliographical references and author index

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    SPIE -- the International Society for Optical Engineering

    SPIE -- the International Society for Optical Engineering

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