20th Annual BACUS Symposium on Photomask Technology : 13-15 September, 2000, Monterey, [California] USA

Author(s)

• Symposium on Photomask Technology
• Grenon, Brian J.
• Dao, Giang T.
• BACUS (Technical group)
• Society of Photo-optical Instrumentation Engineers

Bibliographic Information

20th Annual BACUS Symposium on Photomask Technology : 13-15 September, 2000, Monterey, [California] USA

Brian J. Grenon, Giang T. Dao,chairs/editors ; sponsored by BACUS--the International Technical Group of SPIE dedicated to the advancement of photomask technology, SPIE--the International Sociey for Optical Engineering ; published by SPIE--the International Society for Optical Engineering

（Proceedings / SPIE -- the International Society for Optical Engineering, v. 4186）

SPIE, c2001

Other Title

BACUS Symposium on Photomask Technology

Symposium on Photomask Technology and Management

Photomask technology

Note

Eighteenth conference entitled: Symposium on Photomask Technology and Management

Includes bibliographic references and author index

Details

• NCID: BC07473053
• ISBN:
  • 0819438499
• LCCN: 2004301313
• Country Code: us
• Title Language Code: eng
• Text Language Code: eng
• Place of Publication: Bellingham, Washington
• Pages/Volumes: xv, 938 p.
• Size: 28 cm
• Classification:
  • LCC : TK7874
  • DC22 : 621.3815/31
• Subject Headings:
  • LCSH : Integrated circuits -- Masks -- Congresses
  • LCSH : Microlithography -- Congresses
• Parent Bibliography ID:
  • BA0022700X