20th Annual BACUS Symposium on Photomask Technology : 13-15 September, 2000, Monterey, [California] USA

著者

• Symposium on Photomask Technology
• Grenon, Brian J.
• Dao, Giang T.
• BACUS (Technical group)
• Society of Photo-optical Instrumentation Engineers

書誌事項

20th Annual BACUS Symposium on Photomask Technology : 13-15 September, 2000, Monterey, [California] USA

Brian J. Grenon, Giang T. Dao,chairs/editors ; sponsored by BACUS--the International Technical Group of SPIE dedicated to the advancement of photomask technology, SPIE--the International Sociey for Optical Engineering ; published by SPIE--the International Society for Optical Engineering

（Proceedings / SPIE -- the International Society for Optical Engineering, v. 4186）

SPIE, c2001

タイトル別名

BACUS Symposium on Photomask Technology

Symposium on Photomask Technology and Management

Photomask technology

注記

Eighteenth conference entitled: Symposium on Photomask Technology and Management

Includes bibliographic references and author index

詳細情報

• NII書誌ID(NCID): BC07473053
• ISBN:
  • 0819438499
• LCCN: 2004301313
• 出版国コード: us
• タイトル言語コード: eng
• 本文言語コード: eng
• 出版地: Bellingham, Washington
• ページ数/冊数: xv, 938 p.
• 大きさ: 28 cm
• 分類:
  • LCC : TK7874
  • DC22 : 621.3815/31
• 件名:
  • LCSH : Integrated circuits -- Masks -- Congresses
  • LCSH : Microlithography -- Congresses
• 親書誌ID:
  • BA0022700X