11th Annual Symposium on Photomask Technology : September 25-27, 1991, Sunnyvale, California

Author(s)

• Symposium on Photomask Technology
• BACUS (Technical group)

Bibliographic Information

11th Annual Symposium on Photomask Technology : September 25-27, 1991, Sunnyvale, California

sponsored by BACUS--the International Technical Group of SPIE dedicated to the advancement of photomask technology

（Proceedings / SPIE -- the International Society for Optical Engineering, v. 1604）

SPIE, c1992

Other Title

Eleventh Annual Symposium on Photomask Technology

Note

Includes bibliographical references and index

Details

• NCID: BA26322083
• ISBN:
  • 081940733X
• LCCN: 91068116
• Country Code: us
• Title Language Code: eng
• Text Language Code: eng
• Place of Publication: Bellingham, Wash.
• Pages/Volumes: vii, 348 p.
• Size: 28 cm
• Classification:
  • LCC : TK7874
  • DC20 : 621.3815
• Subject Headings:
  • LCSH : Integrated circuits -- Masks -- Congresses
  • LCSH : Microlithography -- Congresses
• Parent Bibliography ID:
  • BA0022700X