11th Annual Symposium on Photomask Technology : September 25-27, 1991, Sunnyvale, California

著者

• Symposium on Photomask Technology
• BACUS (Technical group)

書誌事項

11th Annual Symposium on Photomask Technology : September 25-27, 1991, Sunnyvale, California

sponsored by BACUS--the International Technical Group of SPIE dedicated to the advancement of photomask technology

（Proceedings / SPIE -- the International Society for Optical Engineering, v. 1604）

SPIE, c1992

タイトル別名

Eleventh Annual Symposium on Photomask Technology

注記

Includes bibliographical references and index

詳細情報

• NII書誌ID(NCID): BA26322083
• ISBN:
  • 081940733X
• LCCN: 91068116
• 出版国コード: us
• タイトル言語コード: eng
• 本文言語コード: eng
• 出版地: Bellingham, Wash.
• ページ数/冊数: vii, 348 p.
• 大きさ: 28 cm
• 分類:
  • LCC : TK7874
  • DC20 : 621.3815
• 件名:
  • LCSH : Integrated circuits -- Masks -- Congresses
  • LCSH : Microlithography -- Congresses
• 親書誌ID:
  • BA0022700X